The Working Principle And Application Range of The Vapor Deposition Furnace Are Explored

Vapor deposition furnace is a commonly used film deposition equipment, which grows thin film material on the surface of substrate by vapor deposition technology. It works by transferring a gas or gas mixture to the surface of a heated substrate, causing it to undergo a chemical reaction on the surface and deposit to form a film. This technology can prepare thin film materials with specific functions and structures, and is widely used in semiconductor, optoelectronics, display devices and other fields.

Vapor deposition furnaces are divided into two types: chemical vapor deposition (CVD) and physical vapor deposition (PVD). CVD is the use of gas on the surface of the substrate chemical reaction to form a thin film, common CVD, plasma enhanced chemical vapor deposition (PECVD) and so on. PVD is the evaporation or sputtering of the source material in a vacuum environment to form a thin film, common magnetron sputtering, electron beam evaporation and so on.

The application range of vapor deposition furnace is very wide, mainly including the following aspects:

1. Semiconductor industry: the vapor deposition furnace can be used to grow silicon, silicon nitride, aluminum nitride and other thin film materials for the preparation of integrated circuits, solar cells, sensors and other devices.

2. Optoelectronics industry: used for the growth of zinc oxide, perovskite and other functional films, the preparation of photodetectors, lasers and other optoelectronic devices.

3. Display device industry: used to grow indium tin ITO oxide, indium fluoride, zinc fluoride and other transparent conductive film, used to prepare liquid crystal display, organic light emitting diode and other display devices.

4. Preparation of various coatings: used for growing coating materials, such as metal coating, ceramic coating, polymer film, etc., for anti-corrosion, thermal conductivity, optics and other functions.

5. Nanomaterials research: carbon nanotubes, graphene and other nanomaterials can be prepared through the vapor deposition furnace for research and application in the field of nanotechnology.

In general, the vapor deposition furnace is a very important film deposition equipment, which can be used to prepare various functional film materials and is widely used in various fields. With the continuous development and progress of science and technology, the application range of gas deposition furnaces will be more extensive, and bring more technological innovation and development opportunities for related industries.